Our Products
Product Introduction
Core advantages:
1. Free of metal impurities such as Na⁺, K⁺, Ca²⁺—no metal contamination for semiconductors, molecular sieves, or pharmaceutical synthesis;
2. Both lipophilic and hydrophilic—an efficient phase-transfer catalyst;
3. Mild and controllable alkalinity, with strong selectivity for silicon substrate corrosion without over-etching the wafer;
4. Volatile decomposition products, leaving no inorganic salt residue.
Detailed Report:
1.Tetraethylammonium HydroxideProduct Datasheet.pdfApplications
Application fields:
1. Semiconductor / display industry (largest high-end demand): ultra-clean, high-purity electronic-grade TEAOH is a core wet electronic chemical for photolithography: photoresist developer—dissolves exposed positive photoresist to precisely form micro/nano circuit patterns, standard for 28nm and mature process nodes; wafer cleaning / photoresist stripping—removes organic residues and photoresist residues from wafer surfaces; silicon selective micro-etching—used for fine etching of CIS image sensors and FinFET structures; LCD/OLED panels—polyimide alignment layer preparation, promoting imidization to form a uniform liquid crystal alignment layer.
2. Molecular sieve / catalytic material synthesis: dedicated templating agent (structure-directing agent) for the preparation of SSZ-13, SAPO-34, and ZSM-series zeolite molecular sieves used in automotive denitrification and methanol-to-olefin catalyst supports, controlling molecular sieve pore structure.
